http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101750290-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41733 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02636 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66765 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate | 2010-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101750290-B1 |
| titleOfInvention | Manufacturing method of thin film transistor and manufacturing method of thin film transistor array substrate |
| abstract | More particularly, the present invention relates to a method of manufacturing a thin film pattern and a method of manufacturing a thin film transistor and a thin film transistor array substrate using the same, which simplifies a manufacturing process of a thin film transistor or a thin film transistor, A method of manufacturing a thin film pattern includes aligning a shadow mask having an open area and a blocking area on a substrate; Forming a thin film pattern on the substrate corresponding to the open region through a deposition process using the shadow mask; Removing the shadow mask; And removing a tail portion of the thin film pattern formed in the thin film pattern formation step. |
| priorityDate | 2010-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.