http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101748909-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02592 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02502 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02667 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101748909-B1 |
| titleOfInvention | Trench filling method and processing apparatus |
| abstract | The present invention provides a method of filling a trench formed in an insulating film of an object to be processed. The method includes the steps of: forming a first amorphous silicon film containing impurities along a wall surface defining a trench; forming a second amorphous silicon film on the first amorphous silicon film; And annealing the object to be processed after formation. |
| priorityDate | 2013-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.