| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C235-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D411-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D411-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-76 |
| filingDate |
2014-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101735596-B1 |
| titleOfInvention |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound |
| abstract |
(B) a compound which is different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a compound which is different from the compound (A) ) An actinic ray-sensitive or radiation-sensitive resin composition containing a resin which does not react with an acid generated from the compound (A) and can reduce the solubility of the organic solvent-containing developer by the action of an acid generated from the compound (B) (Ii) a step of exposing the film; and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; The above active radiation-sensitive radiation-sensitive resin composition; A resist film using the composition is provided. |
| priorityDate |
2013-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |