http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101732050-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C45-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C29-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-56 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D71-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101732050-B1 |
| titleOfInvention | Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device |
| abstract | A step of passing a liquid containing an organic solvent through a filtration apparatus having a liquid inlet portion, an liquid outlet portion, and a filtration filter film provided in a flow passage connecting the liquid inlet portion and the liquid outlet portion, (TI-To) of the difference between the temperature (TI) of the liquid at the liquid inlet portion and the temperature (To) of the liquid at the liquid outlet portion, ) Is not more than 3 DEG C, the filtration rate of the liquid in the filtration apparatus is not less than 0.5 L / min / m < 2 >, and the filtration pressure by the liquid in the filtration apparatus is not more than 0.1 MPa In the negative pattern forming technique for forming a pattern (for example, a pattern of 30 nm node or less) by using an organic developing solution, the generation of particles is suppressed by the method of producing an organic- One, provides a chemically amplified resist film patterning method of the organic liquid for treatment, and a chemically amplified resist film is patterned organic-based process fluid, a pattern forming method for using the same, the manufacturing method for an electronic device, and electronic device. |
| priorityDate | 2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 172.