http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101722785-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D339-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D339-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D339-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 |
| filingDate | 2009-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101722785-B1 |
| titleOfInvention | Method for producing acrylate derivative, acrylate derivative, and intermediate thereof |
| abstract | 1) A photoresist composition capable of forming a photoresist film having excellent reactivity to an acid and thermal stability, swelling at the time of development, and having a refractive index at a wavelength of 193 nm of preferably 1.72 or more. As a photoresist composition, 2) a method for producing an acrylic ester derivative as described below, which can be used as a raw material for a polymeric compound for obtaining a photoresist composition which can be used for producing a photoresist composition, 2) ≪ / RTI > |
| priorityDate | 2008-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 293.