http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101722296-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F18-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F18-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-16 |
| filingDate | 2014-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101722296-B1 |
| titleOfInvention | Negative resist composition and patterning process |
| abstract | The present invention provides a negative resist composition comprising as a base resin a polymer compound having a repeating unit a of the formula (1) and a repeating unit b having a hydroxy group. (Wherein R 1 is an alkylene group, R 2 is H, CH 3 or CF 3 , R 3 is H or CH 3 and Y 1 is a single bond, -C (═O) -O- or -C R 4 is a single bond or an alkylene group, R 5 is H, F, CF 3 or an alkyl group, R 6 is a single bond or an alkylene group, m is 0 to 4, n is 1 or 2, 0 < a < 1.0, 0 < b < 1.0) The negative resist composition of the present invention has a high dissolution contrast in an alkali developing solution, thereby having a high sensitivity and high resolution, a favorable pattern shape after exposure, and a suppressed acid diffusion rate. |
| priorityDate | 2013-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 189.