http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101720967-B1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
filingDate 2009-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101720967-B1
titleOfInvention Substrate processing liquid and method for processing resist substrate using same
abstract The present invention provides a resist substrate treatment liquid capable of efficiently removing resist residues remaining on the surface of the resist substrate after development and capable of making the pattern finer, and a method of treating a resist substrate using the same. The resist substrate treatment liquid for treating the resist substrate having the developed resist pattern comprises a solvent that does not dissolve the developed photoresist pattern and a polymer that is soluble in the solvent. It is possible to efficiently remove the resist residue on the surface of the substrate by bringing the resist substrate after the development treatment into contact with the resist substrate treatment liquid and rinsing with a rinsing liquid such as water. As the solvent, water is preferably used, and as the polymer, a water-soluble polymer is preferably used.
priorityDate 2008-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 48.