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filingDate 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_122e2a039e37d78d2a2ba0138e561e85
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publicationDate 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101720895-B1
titleOfInvention Nanoimprinting method
abstract The present invention discloses a nanoimprinting method. A nanoimprinting method according to an embodiment of the present invention includes: plasma processing a surface of a substrate; Forming an adhesive primer layer comprising a polyimide and a silane compound on the plasma-treated substrate; Forming a resist layer comprising polyimide on the adhesive primer layer; And forming the resist layer as a nanoimprint layer using a nanoimprint mold. According to the embodiment of the present invention, the resist layer can be easily separated from the nanoimprint mold by forming an adhesive primer layer between the substrate and the resist layer.
priorityDate 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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