http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101719025-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-243 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 2011-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101719025-B1 |
| titleOfInvention | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board |
| abstract | It is very sensitive to light having a wavelength of 350 nm to 410 nm and is excellent in resolution, adhesion, and baking-out after exposure, and a stable throughput can be obtained. Further, solubility in a solvent is good, To provide a photosensitive resin composition which is difficult to generate. The present invention relates to a photopolymerizable composition comprising (A) a binder polymer, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) an N, N, N ', N'-tetraarylbenzidine derivative represented by the following formula And a photopolymerization initiator. [Chemical Formula 1] (Wherein R1 to R4 each independently represent an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, or an amino group). (2) (Wherein R5 and R6 each independently represent an alkyl group having 4 or more carbon atoms, an alkoxy group having 4 or more carbon atoms, a halogen atom, or an amino group). |
| priorityDate | 2010-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 126.