Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1805 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101716289-B1 |
titleOfInvention |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
abstract |
The present invention relates to a resin composition comprising (i) a resin (A) having a repeating unit having a group capable of generating a polar group and a repeating unit having an aromatic group decomposed by the action of an acid, a compound (B) generating an acid by irradiation with an actinic ray or radiation, , And a solvent (C) to form a film; (ii) exposing the film; And (iii) a step of developing the exposed film using a developing solution containing an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group or the like And / or the sensitizing actinic radiation-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring or the like. |
priorityDate |
2011-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |