http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101712185-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d825814c2847d297de844b4e7c60de4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41F15-36 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41F15-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 |
| filingDate | 2016-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ba36c5d15c0b5c6fa69fb41022d8515 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a651dd7430a8c70a39b02850be01ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b190d324b3f5aba1eb6078591b79f201 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3f07cd1a8a295b442b2e6457d105b59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e33c5bb4a9bdb94661cd7cd86bcc421b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83d9272d6ce9986e5cf50386ff3b87ab |
| publicationDate | 2017-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101712185-B1 |
| titleOfInvention | Forming Method for Conductive pattern using for intense pulsed light-sintering and conductive pattern formed thereby |
| abstract | The present invention relates to a method of manufacturing a mask pattern, comprising the steps of: (a) printing a mask solution on a lower surface of a transparent substrate to produce a mask pattern layer which provides an opaque region for intensified pulsed light (IPL) (b) applying a conductive solution to an upper surface of the transparent substrate to form a conductive layer, (c) irradiating intensified pulsed light (IPL) to the mask pattern layer, and (d) And a step of removing the unconsumed conductive layer and the mask pattern layer by the IPL being opaque by the mask pattern layer, thereby forming a conductive pattern using the light sintering method. The method of forming a conductive pattern according to the present invention is characterized in that IPL light is selectively transmitted through a mask pattern layer printed on a lower surface of a substrate to provide an impermeable region and a conductive layer formed on an upper surface of the substrate is patterned , The process is simplified and the continuous process can be performed as compared with the prior art in which a pattern is formed by using a mask, thereby reducing the production cost through mass production of the conductive pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022250113-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190036211-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101987387-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102026181-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190016278-A |
| priorityDate | 2016-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 84.