http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101707483-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F16-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-533 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-533 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-36 |
| filingDate | 2014-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101707483-B1 |
| titleOfInvention | Novel monomer, polymer and resist composition comprising the same |
| abstract | In the present invention, it is preferable to use a monomer which is useful for forming a resist pattern having excellent sensitivity and resolution by preventing reduction in thickness and deterioration of etching resistance of resist during pattern formation by lithography, in particular, pattern formation by NPD method, A polymer and a resist composition comprising the polymer are provided. |
| priorityDate | 2013-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 136.