| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D143-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101706688-B1 |
| titleOfInvention |
Positive resist composition for immersion exposure and pattern forming method |
| abstract |
A positive resist composition for liquid immersion lithography comprising: (A) a resin which is decomposed by the action of an acid to increase the solubility in an alkali developing solution; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; And (D) a solvent represented by any one of the following formulas (S1) to (S3) defined in the specification, wherein the total amount of the at least one solvent is a mixed amount And a mixed solvent of 3 to 20 mass% with respect to the total solvent of the solvent (D). |
| priorityDate |
2008-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |