| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F132-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2011-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101704474-B1 |
| titleOfInvention |
Additive for resist and resist composition comprising same |
| abstract |
The present invention relates to a resist additive represented by the following general formula (1) and a resist composition containing the additive. The additive is applied to a resist composition to move to the upper portion of the resist film during the formation of the resist film to increase the hydrophobicity of the resist film surface In the exposure step of immersion lithography, water repellency is suppressed, and in the developing step, it is converted into hydrophilic property by the deprotection reaction. As a result, a fine resist pattern having excellent sensitivity and resolution can be formed: [Chemical Formula 1] Wherein each substituent is as defined in the specification. |
| priorityDate |
2011-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |