http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101702510-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2013-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101702510-B1 |
| titleOfInvention | The method for manufacturing photosensitive resin film and photosensitive resin film manufactured by the same method |
| abstract | (A) applying a positive photosensitive resin composition comprising an alkali-soluble resin, a crosslinking agent, a photoacid generator, and a solvent onto a substrate; (B) pre-heating (prebaking) the applied positive photosensitive resin composition at 150 ° C to 200 ° C after drying; (C) pre-heating and then exposing; (D) after the exposure and development; And (E) a step of curing after development, and a photosensitive resin film produced by the above method. |
| priorityDate | 2013-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 131.