http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101701523-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101701523-B1 |
| titleOfInvention | Radiation-sensitive resin composition, and resist pattern formation method |
| abstract | An object of the present invention is to provide a resist composition which is excellent in pattern basicity such as sensitivity, resolution, LWR, development defect, pattern decay resistance and the like and which is capable of suppressing a watermark defect and a bubble defect at immersion exposure To provide a radiation-sensitive resin composition that exhibits water repellency on the surface of a resist film and a method of forming a resist pattern using the composition. The resin composition of the present invention comprises a resin (A) containing a repeating unit which becomes alkali-soluble by the action of an acid and does not contain a repeating unit containing a fluorine atom, a radiation-sensitive acid generator (B) Containing resin (C) comprising a repeating unit which becomes alkali-soluble by the action of an acid and a repeating unit containing a fluorine atom and a lactone compound (D), wherein the content of the lactone compound (D) ) Is in the range of 31 to 200 parts by mass. |
| priorityDate | 2008-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 469.