http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101697997-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0201 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2010-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101697997-B1 |
| titleOfInvention | Method of cleaning and micro-etching semiconductor wafers |
| abstract | The present invention relates to a cleaning and micro-etching method for semiconductor wafers, and more particularly to a method for cleaning and micro-etching semiconductor wafers by applying a sufficient amount of an aqueous alkaline solution comprising at least one quaternary ammonium hydroxide, at least one alkali metal hydroxide and at least one intermediate alkoxylate To a method of removing inorganic contaminants and organic contaminants from a semiconductor wafer and simultaneously micro-etching the semiconductor wafer. |
| priorityDate | 2009-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 82.