| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31909
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-418 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101697802-B1 |
| titleOfInvention |
Acid-etch resistant, protective coatings |
| abstract |
Methods of using such compositions as a protective layer during the manufacture of the novel compositions and semiconductors and MEMS devices are provided. The composition comprises a cycloolefin copolymer dispersed or dissolved in a solvent system and can be used to form a layer that protects the substrate during acid etching and other processing and handling. The protective layer may be photosensitive or non-photosensitive and may be used with or without a primer layer under the protective layer. A preferred primer layer comprises a basic polymer in a solvent system. |
| priorityDate |
2009-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |