http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101688665-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D497-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C317-04 |
| filingDate | 2011-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101688665-B1 |
| titleOfInvention | Resist composition, method of forming resist pattern, novel compound, and acid generator |
| abstract | 1. A resist composition comprising a base component (A) whose solubility in an alkali developer is changed by the action of an acid and an acid generator component (B) which generates an acid by exposure, wherein the acid generator component (B) Wherein R X is a divalent aliphatic group having 3 to 20 carbon atoms and R Y is a divalent aliphatic group having 3 to 20 carbon atoms having -C (= O) -O- or -S (= O) 2 - (Wherein R < 1 > and R < 2 > each independently represent a divalent linking group and Z < + & gt ; is a monovalent organic cation) . [Chemical Formula 1] |
| priorityDate | 2010-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 365.