http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101688605-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2015-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101688605-B1 |
| titleOfInvention | New aromatic ring copolymers and hardmask compositions with anti-reflective property |
| abstract | The present invention relates to a new type of hard mask polymer having antireflective properties useful in semiconductor lithographic processes and compositions comprising same, wherein the spirobifluorene-based polymers and compositions according to the present invention have very good optical properties, Mask etch selectivity ratio, while at the same time providing coating film quality using spin-on coating techniques with good solubility characteristics. |
| priorityDate | 2015-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.