| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2013-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101685239-B1 |
| titleOfInvention |
Acid generator, chemically amplified resist composition, and patterning process |
| abstract |
[PROBLEMS] To provide a novel acid generator suitable as an acid generator of a resist material, such as satisfying the problem of LER and depth of focus, without being accompanied by deterioration of resolution and being widely and effectively used, And to provide a chemically amplified resist material and a pattern forming method using the same. [MEANS FOR SOLVING PROBLEMS] An acid generator which is sensitive to high energy rays or heat and generates a sulfonic acid represented by the following general formula (1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102287711-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150122073-A |
| priorityDate |
2012-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |