http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101678473-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A44B19-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A44B19-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A44B19-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A44B19-36 |
| filingDate | 2014-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101678473-B1 |
| titleOfInvention | Method for producing color filter |
| abstract | An object of the present invention is to provide a method of manufacturing a color filter in which peeling of a color filter in a resist pattern removing step is suppressed. A method of manufacturing a color filter of the present invention includes a cured film forming step of forming a cured film containing metal oxide particles having a primary particle diameter of 1 nm to 100 nm on a support, A step of forming a photoresist layer on the colored layer, a step of forming a photoresist layer on the colored layer, a step of forming a resist pattern on the colored layer by removing the photoresist layer in a pattern shape, An etching step of etching the colored layer by a dry etching method using an etching gas, and a resist pattern removing step of removing a resist pattern remaining after the etching step. |
| priorityDate | 2013-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 423.