http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101678228-B1

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filingDate 2009-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101678228-B1
titleOfInvention Reflective mask, reflective mask blank and method for manufacturing reflective mask
abstract The reflective mask of the present invention comprises a multilayer reflective film (13) having a structure in which a high refractive index layer and a low refractive index layer are alternately laminated on a substrate (11), a multilayer reflective film (13) laminated on the multilayer reflective film (13) And the absorption film 15 absorbs EUV light that is directly incident on the exposure light reflected by the multilayer reflective film through the inside of the film and is reflected by the multilayer reflective film And the multilayer reflective film 13 of the blind area is formed by removing a plurality of layers or entire layers from the upper layer.
priorityDate 2008-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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