http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101644038-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-0026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 |
| filingDate | 2014-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101644038-B1 |
| titleOfInvention | Transparent conductive film, method for manufacturing the same and touch panel containing the same |
| abstract | A transparent conductive film is disclosed, wherein the transparent conductive film is a non-coated substrate comprising plastic; A first laminate formed on the non-coated substrate by high density plasma enhanced chemical vapor deposition (HD-PECVD), the inorganic laminate comprising an inorganic oxide, having a refractive index of 1.6 to 2.0 and a thickness of 0.4 to 1.0 mu m; Wherein the first laminate has an inorganic oxide different from the inorganic oxide contained in the first laminate and has a refractive index of 1.3 to 1.5 and a thickness of 30 nm to 80 nm, the second inorganic oxide being formed on the first laminate by a high density plasma enhanced chemical vapor deposition 2 laminate; And a transparent conductive layer formed on the second laminate and having a thickness of 15 nm to 50 nm. |
| priorityDate | 2014-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.