| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4b5184b7a8fe02a0c2cc4e509230214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_356068227e13eed6ff524f07808e0bf7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2015-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b78edd70e846ea40d0254e05f1f0d72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4c09b9f6e3011875b4fd7eee7df6a9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec7b4087ce670c28b85e169de41a3cde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_966969698eebfde460e255ff2b0b593d |
| publicationDate |
2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101628878-B1 |
| titleOfInvention |
Cmp slurry composition and polishing method using the same |
| abstract |
The present invention relates to a slurry composition for CMP and a polishing method using the slurry composition. More particularly, the present invention relates to a slurry composition for CMP and a polishing method using the slurry composition for polishing a silicon oxide film, a silicon nitride film and a polysilicon film, A slurry composition for CMP which can be effectively applied to a semiconductor manufacturing process which requires selective removal of a silicon nitride film and a polysilicon film to a silicon oxide film, and a polishing method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102082922-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020180061-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020091242-A1 |
| priorityDate |
2015-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |