http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101623764-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C1-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate | 2009-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101623764-B1 |
| titleOfInvention | Dipping solution for use in production of siliceous film and process for producing siliceous film using the dipping solution |
| abstract | The present invention relates to a solution for dipping used in the production of a siliceous film, and provides a dipping solution for forming a uniform siliceous film up to the inside of a recess on a substrate having recesses and protrusions, and a process for producing a siliceous film using the solution will be. Such a dipping solution is for immersing the substrate coated with the polysilazane composition before firing, and comprises hydrogen peroxide, a bubble adhesion preventive agent and a solvent. |
| priorityDate | 2008-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.