| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-32 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B13-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J35-0013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J23-745
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-3054
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G49-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12 |
| filingDate |
2014-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101623428-B1 |
| titleOfInvention |
Metal compound coated colloidal particles, process for making and use therefor |
| abstract |
In the present invention, solid metal compound coated colloidal particles are produced through a process by coating a metal compound on the surface of the colloidal particles. More particularly, the metal compound precursor reacts with a base solution to form a solid metal compound. The solid metal compound is deposited on the surface of the colloidal particles through bonding. Excess ions are removed by ultrafiltration to produce a stable metal compound coated colloidal particle solution. As a solid state catalyst, or as both the catalyst and the abrasive, a chemical mechanical polishing (CMP) composition using metal compound coated colloidal particles prepared by the process provides a uniform removal profile across the entire wafer. |
| priorityDate |
2013-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |