http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101613541-B1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B19-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-10 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0236 |
filingDate | 2013-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2016-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-101613541-B1 |
titleOfInvention | Additive for preparing suede on monocrystalline silicon chip and use method thereof |
abstract | The present invention provides a monocrystalline silicon wafer texturing additive comprising polyethylene glycol, sodium benzoate, citric acid, hydrolyzed polymaleic anhydride, sodium acetate and excess water. The present invention also provides a texturing solution of single crystal silicon wafer texturing comprising an alkali solution and the texturing additive, wherein the mass ratio of the texturing additive to the alkali solution is 0.2 to 5: 100, the alkali solution is an inorganic alkali Or an aqueous solution of an organic alkali. The present invention also provides a method of texturing a single crystal silicon wafer, wherein surface texturing is performed on the single crystal silicon wafer using the texturing solution. The monocrystalline silicon wafer texturing additive is used in the textured surface preparation of monocrystalline silicon wafers and does not require a large amount of isopropyl alcohol or alcohol and significantly reduces the chemical oxygen demand of the texturing solution and also provides a uniform, fine, dense textured cotton pyramid It is possible to lower the texturing cost and reduce the environmental pollution, and it is advantageous for the stability of the process of the crystalline silicon solar cell and has a comparatively great practical value. |
priorityDate | 2013-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.