http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101593517-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-162 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2011-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101593517-B1 |
| titleOfInvention | Wafer washing method |
| abstract | The present invention provides a cleaning method for improving a cleaning process that easily causes pattern collapse in a method of manufacturing a wafer having a concavo-convex pattern on its surface. The present invention relates to a cleaning method of a wafer having a concavo-convex pattern on a surface, comprising: a step of cleaning the wafer with a cleaning liquid; a step of replacing the cleaning liquid held in the concave portion of the wafer with the water- Wherein the cleaning liquid contains 80 mass% or more of a solvent having a boiling point of 55 to 200 deg. C, and the temperature of the water-repellent chemical liquid provided in the replacing step is 40 deg. C or higher and less than the boiling point of the water- At least the surface of the concave portion is water-repellent. |
| priorityDate | 2010-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 535.