http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101591558-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2012-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101591558-B1 |
| titleOfInvention | Patterning process |
| abstract | The present invention relates to a polymer composition comprising a repeating unit having a tertiary ester type acid labile group and / or an acetal type acid labile group and having a cyclic structure and being soluble in an alkali developing solution by an acid, an acid generator and / A photoacid generator which generates a compound having an amino group and a quencher which is added as the case requires, the quencher being inactivated by neutralizing an acid generated in the acid generator, and a resist material containing an organic solvent on a substrate, , And a pattern formation method for obtaining a negative pattern by alkaline water development. According to the present invention, the unexposed portion and the overexposure portion are insoluble in an alkali developing solution, and only a middle exposure amount portion can have a dual tone property dissolved in a developing solution. |
| priorityDate | 2011-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 180.