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filingDate 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101589165-B1
titleOfInvention Silane composition and cured film thereof, and method for forming negative resist pattern using same
abstract A condensation product obtained by hydrolysis and condensation reaction of alkoxysilane is characterized in that the condensation product obtained by heating and firing the condensation product which is difficult to obtain in the condensate obtained by the hydrolysis and condensation of alkoxysilane by the conventional method, , A hard film having a pencil hardness of 5H or more is obtained and a problem that cracks are not generated in a film having a film thickness of 3.0 mu m or more is solved. [MEANS FOR SOLVING PROBLEMS] Formula (1): (CH 3) Si (OR 1) with alkoxy silane A represented by 3, the general formula (2): (Ph) and the alkoxysilane B represented by Si (OR 1) 3 general formula (3): (CH 3) 2 Si (OR 1) an alkoxysilane represented by C is represented by a molar ratio of 2 alkoxysilane a: alkoxysilane B: alkoxysilane C = 30~70: 10~50: 20~ Lt; RTI ID = 0.0 &gt; 60, &lt; / RTI &gt; and a polyether-modified polydimethylsiloxane.
priorityDate 2011-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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