| abstract |
The present invention provides a radiation-sensitive composition comprising a resist composition having a high sensitivity, a high resolution, a high etching resistance, a low outgassing amount, and a resist pattern profile obtained, and a resist pattern forming method using the radiation- A composition for forming a novel photoresist underlayer film substantially free from a drawback, and a sublayer formed therefrom. (Phenolic compound (A2)) having a carbon number of 2 to 59 and having 1 to 4 formyl groups (aldehyde compound (A1)) and 1 to 3 phenolic hydroxyl groups having 6 to 15 carbon atoms A cyclic compound (A) having a molecular weight of 700 to 5000, which is synthesized by the reaction, and a cyclic compound having a specific structure and a solvent. A cyclic compound used in this composition. |