http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101585696-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K1-062 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
| filingDate | 2007-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101585696-B1 |
| titleOfInvention | A reflective mask blank for EUV lithography, and a substrate on which the functional film for the mask blank is formed |
| abstract | Provided is a substrate on which a conductive film for an EUV mask blank is formed in which generation of particles due to friction between an electrostatic chuck and a substrate is prevented, a substrate on which a multilayer reflective film is formed using the substrate on which the conductive film is formed, and an EUV mask blank. Wherein the conductive film contains chromium (Cr) and nitrogen (N), and the average concentration of N in the conductive film is 0.1 at% or more and 40 at% %, And the surface state of the conductive film is amorphous, the sheet resistance value of the conductive film is 27? /? Or less, and the surface roughness (rms) of the conductive film is 0.5 nm or less. .n n n n Conductive film, average concentration, amorphous, sheet resistance value, surface roughness, average concentration |
| priorityDate | 2006-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.