http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101581603-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3088 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101581603-B1 |
| titleOfInvention | Double patterning lithography techniques |
| abstract | Techniques for performing double patterning of a lithographic feature using a barrier layer between pattern layers are disclosed. In some cases, these techniques may be implemented, for example, by dual patterning of one-dimensional or two-dimensional photolithographic features. In some embodiments, the barrier layer may be patterned to protect the first photoresist pattern prior to application of the second photoresist pattern, and / or to remove the trenches, holes, or other etchings to be formed on the substrate or other suitable surface through lithographic processes (E.g., shrink) one or more of the critical dimensions of a possible geometric feature. In some embodiments, these techniques may be implemented to create / print small features (e.g., about 100 nm or less) that include various complexities of one- and two-dimensional features / structures. |
| priorityDate | 2011-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.