http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101575759-B1

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filingDate 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101575759-B1
titleOfInvention Mask blank, an exposure mask manufacturing method, and an imprint template manufacturing method
abstract The mask blank has a substrate and a thin film formed thereon and used for forming a pattern. This mask blank is constituted such that dry etching corresponding to a method of manufacturing an exposure mask is performed by patterning the thin film by dry etching using a substantially oxygen-free etching gas in which a resist pattern is formed on a thin film used as a mask. The thin film has a protective layer formed at least on the upper layer thereof and containing at least 60 atomic% of oxygen. For example, the dry etching is performed using a chlorine-based gas with little oxygen.n n n n Mask blank, patterning, exposure, etch gas.
priorityDate 2007-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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