http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101574948-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45587 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45504 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2014-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101574948-B1 |
| titleOfInvention | Apparatus for controlling gas stream |
| abstract | The process gas flow adjusting device according to an embodiment of the present invention includes a process gas guide unit installed on a side wall of a chamber and guiding a flow of the process gas to move the process gas provided to the inside of the chamber toward the substrate; A pressurized gas guide portion positioned above the process gas guide portion and guiding the flow of the pressurized gas so that the pressurized gas provided to the inside of the chamber flows in a flow for pressing the process gas; And a position control unit connected to the process gas guide unit and the push gas guide unit and configured to adjust the horizontal position of the process gas guide unit and the push gas guide unit with respect to the substrate so as to control the flow of the process gas deposited on the substrate, It is preferable to control the flow of the pushing gas to be pressed. |
| priorityDate | 2014-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.