http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101557771-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2009-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101557771-B1 |
| titleOfInvention | Cleaning solution for removing photoresist |
| abstract | The present invention relates to a cleaning liquid for removing photoresist which does not leave sulfate ions. More particularly, the present invention relates to a composition comprising 3 to 6 wt% of an inorganic alkali, 1 to 5 wt% of a phosphate, 1 to 10 wt% of hydrazine hydrate, 1 to 5 wt% of a chelating dispersant, 1 to 3 wt% of a fluorine surfactant, And 80 to 90 wt% of deionized water. Since the cleaning liquid according to the present invention does not contain sulfate, the photoresist can be removed without occurrence of particle foreign matter, growth foreign matter, or annular unevenness.n n n n Cleaning solution, photoresist, sulfate |
| priorityDate | 2009-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.