| abstract |
The present invention provides a topcoat composition applied onto a resist film, said topcoat composition comprising (A) an alkali soluble resin; (B) a compound containing at least one of Si atoms and F atoms and increasing the contact angle with the surface of the topcoat film; And (C) a solvent.n n n n Topcoat composition, alkaline developer-soluble topcoat film, pattern forming method |