| abstract |
DETAILED DESCRIPTION OF THE INVENTION The present invention describes compositions and methods using a non-crosslinked, resin coated coating for lithographic applications. These materials are designed to undergo changes which, after coating, provide some solvent resistance and, at the same time, aqueous-base solubility. Noncovalent interactions make the removal of coatings easier than covalently crosslinked materials. This type of material is suitable for trench and gap fill applications and for antireflective coatings, spin-on carbon layers and etch masks. |