http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101548791-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101548791-B1 |
| titleOfInvention | Photosensitive resin composition for resist material, and photosensitive resin laminate |
| abstract | (A) 30 to 70% by mass of an alkali-soluble polymer, (B) 20 to 60% by mass of a compound having an ethylenically unsaturated double bond, and (C) 0.1 to 20% by mass of a photopolymerization initiator (B-1) having at least a hydroxyl group, a phenyl group and at least two ethylenically unsaturated double bonds in the molecule, and a compound (B-1) having an ethylenic unsaturated double bond in the molecule, (B-2) having a diaryl group. |
| priorityDate | 2009-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 200.