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filingDate 2014-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101544305-B1
titleOfInvention Method of manufacturing a pattern structure
abstract In the method of manufacturing a pattern structure, barrier rib patterns are formed on a conductive substrate by an imprint lithography process using a polymer mold, and then a metal pattern is formed on the conductive substrate through a plating process between the barrier rib patterns. Thus, a pattern structure having a metal pattern can be formed by a simple process.
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type http://data.epo.org/linked-data/def/patent/Publication

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