http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101541440-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2010-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101541440-B1 |
| titleOfInvention | Resist underlayer film-forming composition which contains polymer photoacid generator, and method for forming resist pattern using same |
| abstract | [PROBLEMS] To provide a composition for forming a resist lower layer film containing a polymer type photoacid generator and a method for forming a resist pattern using the same. [Solution] A composition for forming a resist lower layer film comprising a polymer having a structural unit represented by the following formula (A-1) or a structural unit represented by the following formula (A-2). (In the formulas (A-1) and (A-2), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 represent an organic group. |
| priorityDate | 2009-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 133.