http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101538722-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2011-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101538722-B1 |
| titleOfInvention | Polymer, resist material containing same, and method for forming pattern using same |
| abstract | A resist polymer suitable for microfabrication performed by dry exposure, immersion exposure or double patterning, a resist material containing the resist polymer, and a pattern forming method using the resist material are provided. (1): < EMI ID = (37) (1), each R 1 independently represents a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group, each of R 2 to R 9 independently represents a hydrogen atom, a linear chain having 1 to 20 carbon atoms, A branched or cyclic hydrocarbon group of 3 to 20 carbon atoms, some of the carbon atoms constituting them may be substituted by oxygen atoms, two hydrogen atoms bonded to the same carbon may be replaced by oxygen atoms to form ═O, H in the CH bond may be replaced by OH to form C-OH, or part or all of the hydrogen atoms constituting R 2 to R 9 may be substituted with a fluorine atom. Part or all of R 2 to R 9 May be combined to form a cyclic structure, and n and m are carbon numbers, each independently an integer of 0 to 5) and a repeating unit having an acid-decomposable group Polymers are used. |
| priorityDate | 2010-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 405.