http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101538409-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 |
| filingDate | 2013-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101538409-B1 |
| titleOfInvention | Plasma chemical vapor apparatus and Cathode unit for plasma chemical vapor apparatus |
| abstract | The present invention relates to an electrode unit for a plasma chemical vapor deposition apparatus and a plasma chemical vapor deposition apparatus, wherein the electrode unit is provided with a hollow tube having a circular cross section when viewed in the axial direction, and rotates by a predetermined rotation angle every predetermined period, And a rotation angle setting unit that rotates the circular electrode by the rotation angle. The rotation angle setting unit is configured to rotate the circular electrode by the rotation angle. Thereby, there is provided an electrode unit for a plasma chemical vapor deposition apparatus and a plasma chemical vapor deposition apparatus capable of increasing the cleaning and replacement cycle of the circular electrode and minimizing particle generation and abnormal arc generation, thereby improving the efficiency of use of the circular electrode . |
| priorityDate | 2013-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.