| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4b5184b7a8fe02a0c2cc4e509230214 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2465-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D165-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12 |
| filingDate |
2013-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c16fec287c2c2323bbb5896a8ea05958
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0a605e5f1250d016ea487bc3127a2b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdb6daec169e091fec7843b29bf72fc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d1407e1cc73031035c6d56afa35b0d7 |
| publicationDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101521618-B1 |
| titleOfInvention |
Composition for the formation of a protective thin film having high heat resistance and chemical resistance, and method for preparing a protective thin film using same |
| abstract |
The present invention relates to a protective thin film composition having high heat resistance and high chemical resistance including a coupling compound and a method for producing a protective thin film using the same, wherein the protective thin film obtained from the protective thin film composition according to the present invention has heat Can maintain its shape without deformation and exhibits excellent chemical resistance to an acid, a base or an organic solvent, and can maintain the shape of the exposed interface even in the plasma treatment, so that it can perform an excellent function as a protective film against the underlying material . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101778742-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102231668-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200110988-A |
| priorityDate |
2013-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |