http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101518055-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06
filingDate 2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101518055-B1
titleOfInvention Chemical Etching Composition For Metal Layer
abstract The present invention relates to a composition comprising, based on the total weight of the composition, from 0.5 to 15% by weight of hydrogen peroxide; 1 to 15% by weight of nitrate; From 0.05 to 10% by weight of organic acids, inorganic acids or mixtures thereof; 0.1 to 10% by weight of an organic acid salt; And a single film of AZO or silver (Ag) containing a residual amount of water, or a double film or triple film composed thereof.n n n n AZO, silver, triple film, transparent electrode, pixel electrode
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priorityDate 2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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