| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31616
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B23-0026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06 |
| filingDate |
2009-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101513310-B1 |
| titleOfInvention |
Titania-doped quartz glass member and method of manufacturing the same |
| abstract |
The present invention provides a titania-doped quartz glass member characterized in that, in a refractive index distribution in a plane that reflects EUV light having a wavelength of 70 nm or less, only one pole of the refractive index is present in a central 80% region.n n n According to the present invention, it is possible to provide a titania-doped quartz glass member which gives a high surface precision required for a member for EUV lithography such as a photomask substrate for EUV lithography, and can be used for a EUV lithography photomask substrate Are excellent in flatness and thermal expansion characteristics.n n n n Titania-doped quartz glass member, member for EUV lithography, average coefficient of linear thermal expansion |
| priorityDate |
2008-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |