http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101509590-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A47J43-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A47G21-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 |
| filingDate | 2012-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101509590-B1 |
| titleOfInvention | Polishing pad for chemical mechanical polishing, preparation method of the same, and apparatus for cmp |
| abstract | The present invention relates to a pad body comprising a polymer resin; And a transparent window formed on the pad body, wherein the transparent window comprises at least one selected from the group consisting of a photo-curable resin and a thermosetting resin, a method of manufacturing the same, and a CMP apparatus including the same, When the CMP polishing pad is used, the transparency of the transparent window may be reduced or the protrusion may be minimized during the polishing process, and the polishing end point may be easily detected. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102298194-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102154583-B1 |
| priorityDate | 2011-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.