Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f8dfd5447275bea4b74d914224d6f207 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-2415 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-184 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-24 |
filingDate |
2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f942c98eb4b30989a9c08147697a5c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a10ab7862748c31316e151398dc08ed5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f2de595997ada7e549b88c76c78336f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e94b90eca4e6440da7704c974bf50e6 |
publicationDate |
2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101502556-B1 |
titleOfInvention |
Apparatus for etching graphene and etching method using the same of |
abstract |
A graphene etch device is disclosed. The graphene etching apparatus includes a vacuum chamber; A stage disposed within the vacuum chamber and on which the graphene pattern layer is seated; And a power supply unit for applying power to the graphene pattern layer. |
priorityDate |
2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |