http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101502556-B1

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filingDate 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f942c98eb4b30989a9c08147697a5c7
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publicationDate 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101502556-B1
titleOfInvention Apparatus for etching graphene and etching method using the same of
abstract A graphene etch device is disclosed. The graphene etching apparatus includes a vacuum chamber; A stage disposed within the vacuum chamber and on which the graphene pattern layer is seated; And a power supply unit for applying power to the graphene pattern layer.
priorityDate 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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