| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2013-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101493294-B1 |
| titleOfInvention |
Stripping and cleaning compositions for removal of thick film resist |
| abstract |
A stripping and cleaning composition suitable for removal of the film resist comprises about 2 to 55% by weight, based on the total weight of the composition, of at least one alkanolamine or at least one morpholine or mixture thereof; About 20 to about 94 weight percent of one or more organic solvents; And about 0.5 to 60 wt% water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102471495-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11347149-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200088493-A |
| priorityDate |
2012-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |